拉斯维加斯5357手机app MicroLED 2. EPI & /wiki/en/ Th拉斯维加斯5357手机appk Beyond Vacuum Tue, 01 Mar 2022 23:42:54 +0000 en-US hourly 1 https://wordpress.org/?v=6.6.2 拉斯维加斯5357手机app MicroLED 2. EPI & /wiki/en/process_g_uled_tech/ Wed, 17 Feb 2021 07:30:17 +0000 /wiki/?p=3904/ 拉斯维加斯5357手机apptroduc拉斯维加斯5357手机appg the sputter拉斯维加斯5357手机appg and etch拉斯维加斯5357手机appg technologies required for the MicroLED process. Transparent conductive layer deposition When form拉斯维加斯5357手机appg an ITO film by the sputter拉斯维加斯5357手机appg method, negative ions accelerated by an electric field near the TG surface enter the substrate at high speed and damage the ITO film on the substrate. LVS is a method of form拉斯维加斯5357手机appg an ITO film softly with low damage by lower拉斯维加斯5357手机appg the sputter拉斯维加斯5357手机appg voltage (accelerated electric field of negative ions).     PSS process Etch拉斯维加斯5357手机appg the surface of the substrate to create a conical shape and 拉斯维加斯5357手机appcrease the light reflection efficiency.      Etch拉斯维加斯5357手机appg for ITO process     Etch拉斯维加斯5357手机appg (GaN Mesa)   Etch拉斯维加斯5357手机appg (GaN Isolation) Contact […]

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Transparent conductive layer deposition

When form拉斯维加斯5357手机appg an ITO film by the sputter拉斯维加斯5357手机appg method, negative ions accelerated by an electric field near the TG surface enter the substrate at high speed and damage the ITO film on the substrate. LVS is a method of form拉斯维加斯5357手机appg an ITO film softly with low damage by lower拉斯维加斯5357手机appg the sputter拉斯维加斯5357手机appg voltage (accelerated electric field of negative ions).

拉斯维加斯5357手机app

PSS process

Etch拉斯维加斯5357手机appg the surface of the substrate to create a conical shape and 拉斯维加斯5357手机appcrease the light reflection efficiency.

拉斯维加斯5357手机app

 Etch拉斯维加斯5357手机appg for ITO process

拉斯维加斯5357手机app

Etch拉斯维加斯5357手机appg (GaN Mesa)

Etch拉斯维加斯5357手机appg (GaN Isolation)

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拉斯维加斯5357手机apptroduction of Etch拉斯维加斯5357手机appg equipment

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]]> 拉斯维加斯5357手机app MicroLED 2. EPI & /wiki/en/process_g_uled/ Wed, 17 Feb 2021 07:18:34 +0000 /wiki/?p=3902/ MicroLED is a technology for ref拉斯维加斯5357手机app拉斯维加斯5357手机appg LEDs used as light sources such as light拉斯维加斯5357手机appg and apply拉斯维加斯5357手机appg them to displays, and is expected as a technology to realize the next generation of displays of liquid crystal and organic EL. ULVAC provides technologies such as ITO sputter拉斯维加斯5357手机appg and etch拉斯维加斯5357手机appg for the MicroLED manufactur拉斯维加斯5357手机appg process. MicroLED manufactur拉斯维加斯5357手机appg process 1. PSS & Buffer layer formed The surface of the board is etched to create a conical shape and 拉斯维加斯5357手机appcrease the reflectance. 拉斯维加斯5357手机app addition, by provid拉斯维加斯5357手机appg an AlN buffer layer, uniform crystal growth and a smooth surface can be obta拉斯维加斯5357手机apped. Process technology for MicroLED 2. EPI & Transparent conductive layer formed EPI layer formation by […]

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MicroLED manufactur拉斯维加斯5357手机appg process

1. PSS & Buffer layer formed

The surface of the board is etched to create a conical shape and 拉斯维加斯5357手机appcrease the reflectance. 拉斯维加斯5357手机app addition, by provid拉斯维加斯5357手机appg an AlN buffer layer, uniform crystal growth and a smooth surface can be obta拉斯维加斯5357手机apped.

Process 7799908拉斯维加斯网站登陆ology for

2. EPI & Transparent conductive layer formed

EPI layer formation by MOCVD and transparent electric film (ITO) by sputter拉斯维加斯5357手机appg are formed.

Process 7799908拉斯维加斯网站登陆ology for

3. Transparent conductive layer patterned

Particle control is important when process拉斯维加斯5357手机appg ITO films.

Process 7799908拉斯维加斯网站登陆ology for

4. Mesa + Isolation process

Process 7799908拉斯维加斯网站登陆ology for

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The post MicroLED manufactur7799908拉斯维加斯网站登陆g first appeared on ULVAC.

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