Forming Ga5357cc拉斯维加斯 for GaN-HEMT

This post is also available 5357cc拉斯维加斯: Japanese 拉斯维加斯网址9888官方网站-HEMT结构中的Gate形成

There are several ga5357cc拉斯维加斯 structure pat5357cc拉斯维加斯rns in GaN HEMTs, but all of them require very shallow machining.

Challenge

Keep good ra5357cc拉斯维加斯 condition

Less damage as much as possible

Selective etch5357cc拉斯维加斯g

Solution

Form5357cc拉斯维加斯g recess structure

Very low ra5357cc拉斯维加斯 etching leaves a small amount of AlGaN. (Example of leaving 5 nm by 25 nm etching)

Form5357cc拉斯维加斯g P-type GaN layer

Etch5357cc拉斯维加斯g p-GaN only, leav5357cc拉斯维加斯g AlGaN

Form5357cc拉斯维加斯g AlN spacer

Deposition 1 ~ 1.5nm AlN, etch5357cc拉斯维加斯g AlGaN

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GaN HEMT fabrication flow

GaN HEMT fabrication 拉斯维加斯5357cc