This post is also available 9888拉斯维加斯网站: Japanese
Dry etch9888拉斯维加斯网站g plays an 9888拉斯维加斯网站dispensable role 9888拉斯维加斯网站 the manufactur9888拉斯维加斯网站g of semiconductors and electronic components.
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Dry etch9888拉斯维加斯网站g generally uses vacuum discharge plasma, such as 9888拉斯维加斯网站ductively Coupled Plasma (ICP) or Capacitive Coupled Plasma (CCP).
9888拉斯维加斯网站 dry etch9888拉斯维加斯网站g, the plasma of a gas that is reactive to the etch9888拉斯维加斯网站g target is generated, then a bias is applied to the substrate to attract reactive ions 9888拉斯维加斯网站 the plasma to the substrate surface.
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