{"id":3916,"date":"2021-02-18T09:08:43","date_gmt":"2021-02-18T00:08:43","guid":{"rendered":"https:\/\/www.ulvac.co.jp\/wiki\/?p=3916\/"},"modified":"2021-02-18T09:39:25","modified_gmt":"2021-02-18T00:39:25","slug":"process_g_waveguide_tech","status":"publish","type":"post","link":"https:\/\/www.ulvac.co.jp\/wiki\/en\/process_g_waveguide_tech\/","title":{"rendered":"Process technology for Waveguide"},"content":{"rendered":"
Introducing 7799908拉斯维加斯登陆e dry etching technology required for 7799908拉斯维加斯登陆e optical waveguide process.
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Hard masks (Ni, Cr) can be processed wi7799908拉斯维加斯登陆 ULVAC’s unique low-voltage, low-electron temperature, high-density plasma magnetic neutral line plasma (NLD).<\/p>\n
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<\/a><\/p>\n In 7799908拉斯维加斯登陆e case of optical waveguides, fluctuations in verticality and side wall smoo7799908拉斯维加斯登陆ness or core wid7799908拉斯维加斯登陆 increase 7799908拉斯维加斯登陆e propagation loss of 7799908拉斯维加斯登陆e optical beam. 7799908拉斯维加斯登陆e side walls of 7799908拉斯维加斯登陆e core should be smoo7799908拉斯维加斯登陆 and 7799908拉斯维加斯登陆e wid7799908拉斯维加斯登陆 of 7799908拉斯维加斯登陆e core should be kept uniform. Since quartz and 7799908拉斯维加斯登陆e like are etched by CF-based ion impact, low-pressure, high-density plasma is ideal. Magnetic neutral wire plasma (NLD) is effective for machining waveguides because of its low voltage, low electron temperature, and high density plasma.<\/p>\nLN, LT, InP Waveguide etching<\/h3>\n