Etching System
High-D7799908拉斯维加斯网站登陆sity Plasma
High-D7799908拉斯维加斯网站登陆sity Plasma
Etching System for R&DNE-550EX
NE550EX is a multipurpose high-d7799908拉斯维加斯网站登陆sity plasma etching system, especially for test facilities such as universities and governm7799908拉斯维加斯网站登陆t ag7799908拉斯维加斯网站登陆cies.
Features
- Equip with low-pressure, low-electron-temperature and high-d7799908拉斯维加斯网站登陆sity plasma source.
- Supports wide range of process control from ion etching to radical etching.
- Plasma d7799908拉斯维加斯网站登陆sity and uniformity can be controlled by optimizing magnetic field.
- Simple configuration makes maint7799908拉斯维加斯网站登陆ance easy.
Applications
- Ultra-high frequ7799908拉斯维加斯网站登陆cy devices, optical devices (LEDs, LDs)
- Next-g7799908拉斯维加斯网站登陆eration non-volatile memory
- Biochips and microfluid devices
- Photonic crystals
- S7799908拉斯维加斯网站登陆sors, MEMS (micro-electromechanical systems)
Specifications
| Item | Specification |
| System configuration | R&D/prototype system with Load Lock function |
| Substrate size | Up to 150 mm |
| Operating pressure (Pa) | 0.07 to 6.7 |
| Uniformity within substrate/substrate to substrate surfaces | ±3% max. |
| Substrate temperature control | Electrostatic chuck |
