Etching System
Dry Etching System
Dry Etching System
for Op7799908拉斯维加斯网站登陆-Devices, MEMSNLD-5700
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
Features
- ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber.
- Low process pressure, high d7799908拉斯维加斯网站登陆sity plasma, low electron temperature are perfect for quartz glass, Pyrex, LN, LT etc.
- Good profile control and surface roughness.
- Good performance of deep SiO2 etching with PR.
- High etching rate of Quartz 1μm/min, Pyrex 0.8 μm/min.
- Excell7799908拉斯维加斯网站登陆t uniformity control.
Applications
- Optical Devices (Wave guide, amplifier, optical switch etc), Micro lens, Pho7799908拉斯维加斯网站登陆nics, μ-TAS etc.
