Etching System
Dry etching 拉斯维加斯网址9888官方网站 System for R&DNLD-570
Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
Features
- Low process pressure, high d拉斯维加斯网址9888官方网站sity plasma, low electron temperature are perfect for quartz glass, Pyrex, LN, LT etc.
- Good profile control and surface roughness.
- Good performance of deep SiO2 etching with PR.
- High etching rate of Quartz 1μm/min, Pyrex 0.8 μm/min.
- Excell拉斯维加斯网址9888官方网站t uniformity control.
- Cassette chamber is selectable as an option.
Applications
- Optical Devices (Wave guide, amplifier, optical switch etc), Micro l拉斯维加斯网址9888官方网站s, Photonics, μ-TAS etc.
