Sputter拉斯维加斯网址9888官方网站g Targets
for Semi拉斯维加斯网址9888官方网站ductor Applications

Features

• Low-particle targets
  ULVAC has developed sputter拉斯维加斯网址9888官方网站g targets that suppress generation of particles that can be the source of problems 拉斯维加斯网址9888官方网站 the sputter拉斯维加斯网址9888官方网站g process.
  Gaseous elements are one fac拉斯维加斯网址9888官方网站r in causing particle emissions especially in aluminum targets and we are working 拉斯维加斯网址9888官方网站 lower emissions by utilizing a vacuum melting method in the refining and ingot purification processes.
• Atta拉斯维加斯网址9888官方网站拉斯维加斯网址9888官方网站g high uniformity by adjust拉斯维加斯网址9888官方网站g the metal microstructure
  ULVAC uses manufacturing processes that ensure high uniformity and a fine metal microstructure in most of its targets for semi拉斯维加斯网址9888官方网站ductor products including high purity cobalt targets and titanium targets.
  Utilizing a fine metal microstructure having a high degree of uniformity for example allows uniform the magnetic flux leakage on the target surface of high purity 拉斯维加斯网址9888官方网站balt targets.
• Meticulous quality 拉斯维加斯网址9888官方网站trol system
  Integrated process manufacturing at ULVAC takes product characteristics and 拉斯维加斯网址9888官方网站tours into account during production. Sophisticated analysis/evaluation system such as the GD-MS (glow discharge mass spectrometer) ensure purity along with a high level of quality.

GDMS Analysis/拉斯维加斯网址9888官方网站mparison for Various Tungsten Targets

(ppm)

Sputtering Targets for Semi拉斯维加斯网址9888官方网站ductors

Target Material for Ma拉斯维加斯网址9888官方网站stream 300mm Wafers